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Non-Contact type resistance measurement

Product Features

◆non-contact eddy-current probes

◆Non-Damage measurement by non-contact measurement

◆Fast testing speed

◆Good repeatability

◆High test sensitivity

Application scope

◆ Semiconductor material

◆ Graphene

◆ Transparent conductive film

◆ Carbon Nanotubes

◆ Metal

Parameters	Probe	Resistance Range	Resistance Range	Testing Method
Range	Low-resistance probe	0.005-1 Ω/sq	0.25-50 mΩ·cm	Eddy current method, non- contact
	Mid-resistance probe	0.05-10 Ω/sq	2.5-500 mΩ·cm
	High-resistance probe	10-3000 Ω/sq	0.5-150 Ω·cm
	Ingot probe	0.01-2 Ω·cm
Repeatability	<0.2%(≤50% range)		<0.5%(>50% range)
Accuracy	<2%(≤50% range)		<3%(>50% range)
Probe Information	Type of Probe: Dual-probe (upper and lower probes with a 2-3mm gap), Probe Diameter: Outer diameter 20mm, Inner diameter 14mm (effective testing part), Probe Gap: 30mm
Coordinate Settings	Arbitrary Coordinate Settings
Store data	Internal Database Storage (Exportable Table Files), PDF Test Report containing test information (time, operator), wafer information (number, size, thickness), data information (number of test points, max/min/average values, relative standard deviation, etc.), contour maps, surface maps, etc. CSV Table Data Storable to Remote Server Modifiable report information as per customer requirements
WAFER Information	Size: 2”-8” (inches)		Thickness:100-1500mm
System Requirements	Power Supply: AC220V,50/60Hz Relative Humidity:20%-80%RH		Power: 600W Environment: Temperature 24℃±10℃ Size: 975465425(mm) Lifespan: >10 years

Eddy current method principle

When a detection coil carrying an alternating current approaches the tested conductor, due to the coil’s alternating magnetic field, eddy currents are induced in the tested conductor, creating a magnetic field opposite to the original magnetic field, partially offsetting the original magnetic field, resulting in changes in the resistance and inductance of the detection coil. Eddy current method principle

Applicable Materials

Material	Resistivity	Sheet Resistance
Silicon wafer	Y	Y
Sic wafer /Ingot	Y	Y
GaO wafer /Ingot	Y	Y
GaN wafer 2DEGI	Y	Y
GaAs 2EDG	N	Y
GZO/LTPS/ITO	N	Y
flat panel)	N	Y
TCO(Touch panel)	N	Y
Graphene	N	Y
Metal film	N	Y

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